ULTRAPURE WATER--Microis a two-day conference on Microelectronics Pure Water offering an Executive Forum
consisting of state-of-the-art technical papers and Table-Top exhibits. Typical attendance is 120 individuals, mostly from the
microelectronics industries.
Semiconductor Industry - Water Business Trends and Opportunities
Session co-moderators: Slava Libman, Ph.D.,
Balazs Air Liquide and Marty Burkhart, Hi Pure Tech Inc.
Tuesday, November 13
8:45 AM - Introduction
Session 1: Future Challenges Facing the Semiconductor
Industry
9:00 AM - Semiconductor Industry Trends and Opportunities
Michael Corbett, managing partner, Linx Consulting
9:45 AM - Particle Defectivity Challenges for Sub-16 nm HP
Technology Node
Abbas Rastegar, Ph.D., Lithography- SEMATECH
11:00 AM -Semiconductor
Technology Progress of UPW ITRS and SEMI Cooperation
David Blackford, Ph.D., Fluid Measurement Technologies, Inc., Slava Libman, Ph.D., Balazs Air Liquide; Dan Wilcox, Spansion; and
Marty Burkhart, Hi Pure Tech, Inc.
11:45 AM-1:15 PM—Lunch Break
Session 2: Solutions to Address Electronics Industry UPW
Needs
1:15 PM - Organics Speciation in UPW— Challenges and Opportunities
Slava Libman, Ph.D., Balazs Air Liquide; and Stefan Huber, Ph.D.,
DOC Labor
1:45 PM - Removal of 12-nm particles with a combination of UF
and MF
Donald C. Grant and Dennis Chilcote, CT Associates, Inc.; Uwe
Beuscher, W.L. Gore and Associates, Inc.
2:15 PM - Total Removal of Nanoparticles in Manufacture of
High-Purity Water
Aapo Sääsk, Scarab. To be presented by Mr. Vinay Chand, CEO of
Xzero.
2:45 PM - Drastic Reduction of Metallic Impurities in Water
Using High-Purity Ion-Exchange Resin
Takeo Fukui, Toshimasa Kato, Takaaki Chuuman, and Nobukazu Arai,
Kurita Water Industries Ltd.
3:30 PM - Next Generation Particles Control in Point of Use
Application for UPW Supply to Semiconductor Manufacturing
Boris Eliosov, PCB Water Technologies; and Wolfgang Dornfeld, Levitronix, GmbH
4:00 PM - 450-mm Polyvinylidene Fluoride Pipe and Fittings
Production to Accommodate the Ultrapure Water Volume Demands of
Future MegaFabs
Marty Burkhart, Hi Pure Tech, Inc.; Hanspeter Mueller, Georg Fischer
Piping Systems; and Casey Williamson, Semtec, Inc.
5:00 PM - Networking Reception in Exhibits
Wednesday, November 14
Session 3: UPW Metrology Innovations
9:00 AM - Panel Discussion: Present and Future UPW Technology Challenges and
Opportunities
9:45 AM - Capillary IC— A New Platform for High Throughput or
High Resolution Separations of Ionic Compounds
Peter Bodsky, ThermoFisher Scientific— Dionex Products
10:45 AM - New Developments in the Use of Silica and Sodium
Measurements in High-Purity Water Quality Specifications for the
Electronics Industry
Randy C. Turner, Swan Analytical USA
Session 4: UPW Technology
Optimization and Improvements
Noon-1:15 PM—Lunch in Exhibits Area
1:15 PM— An Updated Look at Minimizing Particle and Metal Ion
Contamination on Fluid Control Components
Ed Cellucci, George Evangelos Drazinakis, and Greg Michalchuk,
Plast-O-Matic Valves
1:45 PM—Challenges Meeting the UPW Requirements
for the Future Fabs
Alan Knapp, Christopher Hall, and Bruce Coulter, Siemens
Industry Inc., Water Technologies
2:15 PM—A Fundamental Shift in Water Disinfection—
Research into an Innovative UV LED Design
Jennifer G. Pagan, and Paolo Batonil, Dot Metrics Technologies;
and Oliver Lawal, Aquionics Inc.
2:45 PM—Overview of Research Projects Underway at
Purdue University’s Birk Nanotechnology Center
Timothy Miller, Purdue University
3:15 PM - Conference Concludes
TABLETOP EXHIBITS TABLETOP EXHIBITS
Exhibit hours: Tuesday: 1:00PM-7:00PM; Wednesday: 11:00AM-3:00PM.
Click here
for an Exhibitor's prospectus.
2012 Exhibitors:
AQUIONICS
AIR LIQUIDE-BALAZS LABS.
ASAHI AMERICA INC.
CHEMTRACE
ETS, LLC.
FLUID MEASUREMENT TECHNOLOGIES
HEATEFLEX CORP.
HYDRANAUTICS
ITOCHU SPECIALTY CHEMICALS
LEVITRONIX GMBH
LIGHTHOUSE WORLDWIDE SOLUTIONS
NEOTECH AQUA SOLUTIONS
ORANGE BOAT LLC
PLAST-O-MATIC VALVES
PROFESSIONAL WATER TECHNOLOGIES
SIEMENS WATER TECHNOLOGIES
SWAN ANALYTICAL USA INC.
WOONGJIN CHEMICAL AMERICA - CSM